The IKo Station 4W8™ is a self-contained, complete plating system – wafer installation, cleaning, DI rinsing and activation – for one 8" wafer or four 4" wafers (each with independent current mode operation). Easily retrofitted to a cleanroom environment.

• micro/macro uniformity <5% across the wafer
• superior process control for sub-mil features
• low purchase and operating costs
• simultaneously processes four 4" or one 8" wafer
• wafer cleaning and plating preparation under the same hood
• extremely fast -- typically, 1µ per minute
• uses off-the-shelf chemistries with minimal additives
• efficiently reuses chemical solution
• easy to use/maintain

The IKo Station 4W8 contains all accessories for processing wafers under one hood. The unit is fabricated with PVC and polypropylene and a minimum of metal parts to avoid potential contamination of electroplating solutions. Metal features are stainless and titanium. All parts can be easily disassembled for maintenance.

The station’s unique arrangement of wafer holder, reciprocating anode, programmable reverse pulse rectifier and pump ensure surpassing performance:

The unit is designed so that each anode/wafer holder set can be individually operated without interrupting the processing of the remaining wafers.

• Wafer holders, ergonomically designed for easy processing and handling. A full-circle, elastic electric gasket/contact provides uniform current distribution. Result: uniform thickness features across the wafer without leaking solution to the back of the wafer.
  
  
• Reciprocating anode, a proprietary feature. Provides for an efficient exchange of matter and uniform electric field distribution.
  
  
• Programmable multi-channel reverse-pulse rectifier, contributes to equipment versatility in handling four individual 4" wafers or one 8" wafer.
  
  
• Fan-out pump with constant filtration (regardless of fine filter medium). Provides a steady-state supply of high-quality bulk solution.

input power:	220/120 VAC +/-10%, 50-60 Hz, single phase, 25/50 A
wafer size:	four 4" or one 8" wafer
metals plated:	Cu, Ni, Pd, Pt, Au, Sn, Pb, Fe, Ag, Permalloy, Pd/Ni, Sn/Pb and others
	Programmable Multi-Channel Reverse Pulse Power Supply:
cells:	4 cells
channels:	4, 1 channel per cell
current pulse avg:	3 A
current peak:	6 A
volt:	0-10 V
programmable timer:	4 digit realtime
anode insoluble:	four 4" and one 8" FIBRoplate™ anode
anode soluble:	four 4" and one 8" FIBRoplate™ basket
wafer holder:	four 4" and one 8" full circle gasket/contact, current collector
filtration:	continuous-cartridge, 400 GPH, 1 µ
reciprocating frequency:	0 – 2.7 Hz
solution volume:	14 liters, 3.7 Gal
thermostat tank:	90C in 1 hour
rinse tank:	10" x 12" x 12", cascade flow
conditioning tank:	10" x 10" x 12", two sections
ref. electrode:	Ag/AgCl or calomel
hood size:	7.5’ W x 3’ D x 6.5’ H (construction material – Polypropylene)
add’l features:	Luggin capillary attachment Bench-top pH meter

Start-Up Support

ECSI provides operating and maintenance manual, installation (IKo CLASSIC and IKo 4W8 only) and initial technical assistance and training as specified bellow:

a. Free of charge training at the Seller's or Buyer’s location for first two (2) days;

b. Travel, room and board expenses paid by the Buyer for the first 2 (two) days at the Buyer's location;

c. At the prevailing hourly rate for any additional day beyond 2 (two) initial days.