The IKo TWIN-STATION™ is a self-contained, complete plating system with two entirely separate IKo CLASSIC units for MEMS and NANO fabrication – each system with wafer installation, cleaning, activation, DI rinsing/nitrogen gun and electroplating. Easily retrofitted to a cleanroom environment.
- micro/macro uniformity <5% across the wafer
- superior process control for mil size and nano structures
- low purchase and operating costs
- simultaneously processing two wafers (2 cm2 to 8")
- identical hydrodynamics for all sizes if needed
- two wafer cleaning and plating preparation sections
- extremely fast -- typically, 1µ per minute
- uses off-the-shelf chemistries with minimal additives
- efficiently reuses chemical solution
- easy to use/maintain
The IKo TWIN-STATION contains all accessories for simultaneous processing 2 wafers with two different electroplating applications under one hood. The unit is fabricated with PVC and polypropylene and a minimum of metal parts to avoid potential contamination of electroplating solutions. Metal features are stainless and titanium. All parts can be easily disassembled for maintenance.
The station’s unique arrangement for substrate preparation, specialized wafer holders, reciprocating anodes, programmable reverse pulse rectifiers and pumps ensure surpassing performance:
The unit is designed so that each anode/wafer holder set can be individually operated in a dedicated IKoCLASSIC unit without interrupting the processing of the other.
- Wafer holders, ergonomically designed for easy processing and handling. A full-circle, elastic electric gasket/contact provides uniform current distribution. Result: uniform thickness features across the wafer without leaking solution to the back of the wafer.
- Reciprocating anodes, a proprietary feature. Provide for an efficient exchange of matter and uniform electric field distribution for a wide range of substrate sizes and shapes.
- Programmable reverse-pulse rectifiers contribute to equipment versatility with independent operating variable selection
- Fan-out pumps with constant filtration (regardless of fine filter medium) provides a steady-state supply of high-quality bulk solution.
| input power: | 220/120 VAC +/-10%, 50-60 Hz, single phase, 15/30 A | |
| hood size: | 7’ W x 3’ D x 6’ H (construction material – Polypropylene) | |
| wafer size: | 2cm2 to 8" | |
| metals plated: | Cu, Ni, Pd, Au, Sn, Pb, Pt, Fe, Ag, Permalloy, Sn/Pb, Pd/Ni and others | |
2 Progeammable Reverse Pulse Power Supplies |
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| current avg: | 0.1 A, 1 A, 3 A, 5 A, 10 A | |
| current peak: | 0.3 A, 3 A, 6 A,10 A, 20 A | |
| volts: | 0-10 V (higher voltages available) | |
| programmable timer: | 4 digit realtime | |
Electroplating Section |
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| anode insoluble: | two any size and shape from 2 cm2 up to 8" FIBRoplate™ anode | |
| anode soluble: | two any size and shape FIBRoplate™ baskets | |
| wafer holder: |
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| filtration: | 2 continuous-cartridge, 400 GPH, 1 µ, filter systems | |
| reciprocating frequency: | 0 – 2.7 Hz | |
| solution volume: | Two 8 liter/2.1 Gal tanks | |
Accessories |
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| rinse tank: | 10" x 12" x 12", cascade flow | |
| conditioning tank: | 10" x 10" x 12", two sections | |
| ref. electrode: | two Ag/AgCl or calomel | |
| add’l feature: | two Luggin capillary attachments | |
| N2/DI: | two Air/Nitrogen guns and DI water spray handy for wafer processing |
Start-Up Support
ECSI provides operating and maintenance manual, installation (IKo CLASSIC and IKo 4W8 only) and initial technical assistance and training as specified bellow:
a. Free of charge training at the Seller's or Buyer’s location for first two (2) days;b. Travel, room and board expenses paid by the Buyer for the first 2 (two) days at the Buyer's location;
c. At the prevailing hourly rate for any additional day beyond 2 (two) initial days.